From October 21 to 22, 2016, the Fourth Sino- and International Conference on the Industrial Plasma Technologies of China (SICIPT 2016), hosted by the Plasma Committee of the Chinese Society of Theoretical and Applied Mechanics, organized by Southern University of Science and Technology (SUSTech), took place at the No. 110 lecture hall of SUSTech’s library. Present were nearly 100 experts and scholars from universities, enterprises and research institutes such as the University of Science and Technology of China, Harbin Institute of Technology, the Center for Fusion Science, Southwestern Institute of Physics, the Institute of Mechanics, Chinese Academy of Sciences and Advanced Micro-Fabrication Equipment Inc. Associate Prof. He Zhubing of the Department of Materials Science and Engineering, SUSTech chaired the Organizing Committee.
At the opening ceremony, Prof. Cheng Xin, Chair of the Department of Materials Science and Engineering, SUSTech, warmly welcomed experts and scholars. He introduced the information of SUSTech and the department in such aspects as talent introduction, talent training, research and future development strategy.
The conference began with three keynote lectures. Wang Younian from Dalian University of Technology gave a plenary lecture entitled “A ICP-oriented Fast Simulation Technology”, introducing the progress and industrial application of the simulation technology of inductively coupled plasma (ICP) and capacitively coupled plasma (CCP); Ni Tuqiang, Vice President of Advanced Micro-Fabrication Equipment Inc., gave a lecture on the latest progress of plasma etching technology, introducing the development cycle of the global semiconductor industry and semiconductor equipment industry, and an investment of over 45 billion US dollars in semiconductor chips and storages in the “thirteenth five-year” period; Qin Shijian, R&D Director of Shenzhen China Star Optoelectronics Technology Co., Ltd., introduced the application of plasma technology in the panel display industry.
23 academic lectures were given subsequently. The lectures attracted great attention from the attendees. The Q&A session was heated. Associate Prof. Wang Fei of the Department of Electrical and Electronic Engineering, SUSTech gave an academic report entitled “Application of Plasma Etching Technology in MEMS Units”.
The conference explored advanced plasma technologies, as well as their application in industries such as semiconductor, flat panel display, new materials, new energy, national defense and aerospace, looked into the future of industrial plasma technologies and other plasma technologies, and cemented the exchanges and cooperation between universities, research institutes and enterprises.
