Thanks to the three-year joint efforts made by the Municipal Building Affairs Administration and relevant departments in our university, the Public Analysis & Testing Center Clean Room Laboratory was put into use recently, which functions as a major carrier for the Science & Engineering Research Center on the Micro/Nano-scale, one of the first-batch research centers in the university. It represents another major progress in the university development of R&D and teaching infrastructures. It is estimated that the Laboratory in the South University of Science and Technology takes the lead among the key universities in China in terms of the construction space, advanced equipment and other indicators.
The Clean Room Laboratory of the Public Analysis & Testing Center is a public platform serving the university-wide research and teaching. It is also opened to those beyond the university to meet their needs. At present, the more than 20 pieces of technical equipment in the Clean Room Laboratory include: E-beam exposure machine, contact ultraviolet exposure machine and automatic coater, ALD, multi-source integrated sputtering apparatus, ICP etcher, RIE etcher and others (see the following pictures). These pieces of technical equipment can be used to develop the new-type NM electronic devices, various MEMS systems, biological chips, new-type low-dimension system materials and semi-conductor materials, relevant green-energy materials and devices.
Those who intend to use the technical equipment in the Clean Room Laboratory have to make appointment on FOM system of South University of Science and Technology. And fees must be paid for using the Laboratory.
E-beam exposure machine: can make minimum 10-NM graphs
The ultraviolet exposure machine can be used to make MEMS sensors
ALD can produce the high-quality film at the atomic level
Multi-source integrated sputtering apparatus has three target sources that can make sputtering on the synchrocavity way
ICP etcher is often used in dry etching of trench and dielectric film
Etcher (RIE) can be used in the dielectric layer etching
Contributed by Public Analysis & Testing Center
